Abstract
AbstractIn the present study, hard TiSiN coating compounds with different Si content have been deposited by the magnetron sputtering technique. X-ray diffraction (XRD) and X-ray absorption spectroscopy (XAS) have been employed to investigate the effects of Si addition on the composition, structure and phase development of the cubic NaCl-type structure. To get some insight on these changes, X-ray absorption spectra have been measured at the Ti and Si K-edges in fluorescence yield mode. The collected data showed that the interaction between Ti and Si was weak and the formation of a-Si3N4 can be assumed. Hardness measurements were also consistent with the formation of hard nanocomposite films. A maximum hardness of about 36 GPa was obtained for the sample with 11 at. % Si.
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