Study of the Effect of Low-Energy Irradiation with O2+ Ions on Radiation Hardening and Modification of the Properties of Thin TiO2 Films

Abstract

The paper presents the results of a systematic study of the effect of exposure to low-energy O2+ ions on the structural, optical, mechanical properties, as well as resistance to degradation and aging of thin TiO2 films. The studied samples were obtained using the magnetron sputtering method; the film thickness was 600 nm. Atomic force and scanning electron microscopy, energy dispersive analysis, X-ray diffraction, and UV–Vis spectroscopy were used as the main research methods. In the course of the results, dose dependences of changes in the properties of thin films were established, and it was also shown that irradiation leads to an increase in hardness and resistance to cracking due to radiation hardening. A decrease in the band gap from 3.61 to 3.43 eV not only changes the optical properties, but also has a significant effect on the change in the conductivity. The novelty and relevance of this study lies not only in obtaining new data on the effect of ionizing radiation on the properties of thin films, but also in expanding the prospects for the use of ion irradiation for the purpose of radiation hardening and modification of new materials.