Abstract
The quartz crystal microbalance (QCM) has recently emerged as useful tools for studying thin films in many fields. QCMs have been continuously improved since their initial research use application as a vacuum deposition monitor and are now used to monitor diverse conditions under vacuum. Applications have rapidly expanded in various tools used to monitor air and liquids. The authors have pursued research on development monitors based on light interference generated by thin films. Resins that dissolve unevenly during development or materials that swell during development do not produce clear interference patterns with conventional evaluation methods based on thin film interference, and obtaining accurate dissolution rates has proven difficult. In response, we developed a QCM-based development analyzer (RDA-QZ3) capable of directly monitoring changes in film mass as changes in frequency. This paper discusses the development behavior of an acrylic chemically-amplified ArF positive resist measured with the new analyzer.
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