Abstract

An Ion Beam Sputtering Monte Carlo Model (IBSM) was modified to study the effect of different surface diffusion mechanics on the surface height and surface roughness of materials when bombarded with energetic ions. The extension was done by incorporating Seahet al.’s semi-empirical ion sputtering equations into the sputter erosion algorithm of the MC model and by enforcing curvature dependence of sputter yield. Also, TRansport of Ions in Matter (TRIM) software, was used to calculate the sputter yield and the values obtained were compared with those obtained from Seahet al.’s semi-empirical model and the sputter yield obtained from sputtering experiments. Our studies show that the surface diffusion mechanics that occurs during a sputtering process controls the substrate surface height and its roughness while curvature dependence of sputter yield has little or no contribution to the target surface height and its roughness. Our comparison of the calculated sputter yield values of TRIM and Seahet al.’s model with experimental sputter yield values show that Seahet al.’s model gives sputter yield values closer to experimental values than TRIM at a normal angle of incidence while TRIM gives sputter yield values closer to experimental values at 60°angle of incidence.

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