Abstract
Deposition of chromium nitride (CrN) thin films on Si(100) and low carbon steel (LCS) substrates has been performed using DC magnetron sputtering technique at different values of power from 100 to 150 W. A methodical study of the influence of power on structural and physical properties of the thin films was effected out. Films structure have been investigated by X-ray Diffraction (XRD) and the grain size decreased with increasing the power. Scanning Electron Microscope (SEM) used to define the thickness, where the thickness increased with the increasing of power. The surface morphology was characterized by Atomic Force Microscope (AFM) as well as by optical microscope for CrN thin films. This work shows that the residual stresses of these films, created from process, increased with the increasing of power. The corrosion examinations were presented by potentiodynamic method, Tafel curves, and electrochemical impedance spectroscopy at water solution. The best corrosion resistance characteristics are exhibited by CrN films at 150 W, having the smallest grain size.
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