Abstract
PurposeThe purpose of this paper is to demonstrate the I‐V characteristics of ZnO film on Si substrates with Ag buffer layer by conductive atomic force (C‐AFM).Design/methodology/approachAn Ag buffer layer and Zn film was first deposited on silicon substrate by RF‐sputtering deposition method from high pure Ag and Zn target, respectively. Then, the deposited film was sintered in air at 500°C for 1 h.FindingsThe structures and morphologies of the prepared films were characterized by X‐ray diffraction (XRD), energy dispersive spectrum (EDS), atomic force microscopy (AFM), and C‐AFM. The results show that the prepared ZnO films with Ag buffer layer have a good crystallinity and surface morphology. Interestingly, the I‐V curve of ZnO film exhibited typical characteristics of semi‐conductive oxide under the conductive Ag buffer layer.Originality/valueThe paper demonstrates, by C‐AFM, that the ZnO/Ag‐buffer/Si exhibits excellent crystal structure, morphology and typical I‐V characteristics.
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