Abstract
A magneto-optical Kerr effect (MOKE) system was built and used for acquiring saturation magnetization curves and measuring the magnetic hardness coefficient, a of magnetic thin film samples. Co thin films were sputtered on glass substrate under various sputtering conditions. The magnetic hardness coefficient was measured using the MOKE setup. Results for /spl alpha/ (Oe) were further correlated using transmission electron microscopy and X-ray diffraction analysis. It was found that /spl alpha/ (Oe), a useful indicator for in-depth defects in Co films, increased with both working and base pressure but decreased with higher deposition temperatures. This trend is in agreement with well-known microstructure control techniques by changing sputtering parameters.
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