Abstract
ABSTRACTThe present contribution reports on measurements of the diffusion coefficients of Hf in a-Zr via the RBS technique. 250 8 Hf thin films were deposited on two kinds of polycrystalIine Zr samples and annealed in a 773-1115 K temperature range. Our results show that in both cases, the diffusion coefficients follow curved flrrhenius plots. On the other hand for the purest Zr sample we have obtained diffusion coefficients that are systematicaly and significativel ly lower than those corresponding to the Zr sample richer in impurities.
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