Abstract
Using high-resolution transmission electron microscopy and photoelectric spectroscopy methods, the effect of Mn δ layer embedding and GaAs coating layer growth techniques in structures with In(Ga)As/GaAs quantum dots and wells on their structural and optoelectronic characteristics is studied. It is shown that the low-temperature GaAs coating layer in a structure with a Mn δ layer is structurally inhomogeneous and can cause a decrease in the quantum-dot photosensitivity.
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