Abstract
Electrochemical experiments were performed to study the inhibitive effect towards copper corrosion of three organic compounds: namely, benzotriazole, 1-hydroxybenzotriazole and 3-amino 1,2,4-triazole. Statistical analysis of pit nucleation times showed that 3-amino 1,2,4-triazole exhibited the most significant inhibitive effect towards pitting. However, impedance measurements revealed that this compound produced a thinning of the passive film. This was corroborated by X-ray photoelectron spectroscopy. Results showed that copper pitting resistance could not be explained only by characterizing the protectiveness of the passive film.
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