Study of atomic excitation in sputtering in collisions of highly charged Xeq+ ions with Al surface

Abstract

In this work, the optical spectra emitted from an Al surface induced by 410 keV Xeq+ (10 ≤ q ≤ 23) ions are measured. The intensities of spectral lines of sputtered Al atoms at 308.09, 309.14, 394.52, and 396.27 nm as a function of projectile potential energy are investigated. The result shows that the ratios of Y(308.09)/Y(309.14) and Y(394.52)/Y(396.27) stay constant and are independent of the potential energy. In the collisions, the photon yields of spectral lines increase with increasing potential energy. According to the electron-transfer model, the excitation process of sputtered Al atoms is discussed. It can be concluded that in the collisions of 410 keV Xeq+ (10 ≤ q ≤ 23) ions with the Al surface, nuclear energy loss determines the sputtering yield, and electron energy loss and potential energy deposited on the target surface affect atomic excitation in sputtering.