Abstract
This paper addresses refractive index (n), extinction coefficient (k), uniformity, and step coverage of APFx film, which can be optimized by varying process parameters, such as precursor flow rate, spacing, chamber pressure, and power. APFx shows good uniformity. APFx has a lower extinction coefficient at 633nm, which makes possible easier alignment. Moreover, APFx has good step coverage and a wide tuning range of conformality, which improves film integrity for photoresist rework.
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