Abstract
The insulating properties, internal stress, and film structure of Si-O-added Al-O films, and their etching characteristics when immersed in water, were investigated to determine their suitability as shield MR head materials for high-density magnetic recording. The films showed good insulating properties, low internal compressive stress, and excellent corrosion resistance in water. It is concluded that the Si-O-added Al-O films with thicknesses of up to 50 nm should be adopted to reduce the thickness of gap-insulating film.
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