Studies on single- and multi-layer InAsN quantum dots grown by solid-source molecular beam epitaxy

Abstract

InAsN quantum dots were grown on GaAs (0 0 1) substrate by a solid-source molecular beam epitaxy system equipped with a radio-frequency nitrogen plasma source. The quantum dot formation was confirmed by reflection high-energy electron diffraction observation and atomic force microscopy measurement. Dot density as high as ∼1×10 11 cm −2 was achieved. Low-temperature and room-temperature photoluminescence measurements were carried out to investigate the optical property of the quantum dots. Multilayer quantum dot structures were found to shift the photoluminescence emission peak to longer wavelength from 1025 to 1120 nm.