Abstract
AbstractTitanium dioxide (TiO2) thin films of different concentrations are prepared by using titanium trichloride on conducting FTO glass substrate by chemical bath deposition (CBD) method. The X‐ray powder diffraction (XRD) method is used to study the structure of TiO2 thin film. XRD analysis has confirmed amorphous nature of the TiO2.The surface morphology of the film is studied using field emission scanning electron microscopy (FE‐SEM). The optical properties are studied using the UV‐VIS and photoluminescence (PL) spectroscopy. The band gap of prepared titanium dioxide (TiO2) thin film is 2.84 eV. A photo‐electrochemical cell analysis shows that the conversion efficiency of 3.24% with a fill factor of 43%.
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