Abstract

Abstract Intrinsic microcrystalline silicon films have been deposited at high-power–high-pressure regime. Effects of pressure and hydrogen dilution on the microstructures of the films have been investigated. Crystalline size decreases at high pressure although the deposition rate increases up to 10 A/s. Microstructure depends sensitively on pressure as well as on hydrogen dilution of silane. Single junction solar cells have been fabricated with Si films having different degrees of crystallinity and grain size and the performances have been studied.

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