Abstract
V2O5 thin films of different thickness values were deposited over ZnO buffer coated layer on glass substrates using reactive DC magnetron sputtering technique. As-deposited ZnO buffer layer and V2O5/ZnO (VZO) thin films were characterized using the X-ray diffraction (XRD), field-emission scanning electron microscopy (FE-SEM), UV-Vis spectrophotometer and interactive source meter to study the structural, morphological, optical and electrical properties respectively. The XRD pattern of the ZnO films showed preferential orientation along the plane (002) and VZO films exhibit polycrystalline nature. FE-SEM micrograph of the ZnO and VZO deposited films showed smooth surface with globular morphology. The optical constants and bandgap of the deposited films were calculated from the transmittance spectra and the bandgap of the ZnO film was found to be 3.26 eV. Electrical and thermo-electrical properties of the deposited VZO films were studied using the electrometer and four point probe method respectively. Electrical resistance of the deposited films was decreased with increase in temperature due to the phase transition.
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