Abstract
Titanium doped tungsten oxide thin films have been deposited by co-sputtering metallic titanium and tungsten in the presence of argon and oxygen. The oxygen chamber pressure was varied in the range 1 × 10 − 3 –4 × 10 − 3 mbar keeping the sputtering power of titanium and tungsten constant at 2 W/cm 2 and 3 W/cm 2 respectively. The effect of oxygen chamber pressure on the electrochromic (EC) properties of titanium doped WO 3 has been investigated in three steps. First, the material properties of EC film were investigated by XRD, SEM, and UV–Vis spectrophotometer; the thickness and the optical constants were estimated from the reflectance measurements. Second, the electrochromic behavior of the EC films was characterized by cyclic voltammetry (CV) using 1.0 M HCl as electrolyte. The optical modulation (Δ T) and coloration efficiency (CE) of the titanium doped tungsten oxide thin film deposited at an O 2 pressure of 4 × 10 − 3 mbar was found to be better with typical values of Δ T = 70% and CE = 66 cm 2/C (at λ = 550 nm). Finally, EC devices consisting of five layers (Glass/ITO/Ti:WO 3/Ta 2O 5/NiO/ITO) have been fabricated and tested.
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