Studies on controlled preferentially orientated Mo thin films via sputtering technique

Abstract

We have reported the growth of selective preferentially oriented Molybdenum (Mo) layers by using DC magnetron sputtering. The deposition power plays an important role to control the various properties of Mo layer. The structural, morphological and electrical properties have been studied with x-ray diffractometer, atomic force microscopy, four-probe resistivity measurement and Hall Effect setup, respectively. The deposition power 120 Watt (W) and above is suitable to produce polycrystalline samples. The micro-strain is found to be reduced upon increasing the power. The texture coefficient obtained for (110) and (211) reflex reveals the Mo layers are preferentially oriented along (110) upto 120 W and (220) oriented for 200 W and above. A significant reduction in sheet resistance is measured for the layers grown at higher deposition power. Uniform, void-free and well adherent Mo layers are observed from AFM images. The mobility is found to be increased nearly 80% for the sample grown at 460 W as compared to the sample deposited at 80 W.