Abstract
Contact resistance is an important limiting factor for the on-state current of graphene based devices. In this paper, both transmission line method and four-probe method are applied to measure the contact resistance in graphene-metal (Cr/Au and Ti/Au) interface. The calculated contact resistivity values by both methods are concentrated at 104 Ωμm2. These two methods are compared and four-probe method showed higher stability. At last, the graphene-Ti/Au devices are annealed at 400 °C with argon and hydrogen gas flow. After annealing, the contact resistivity values are reduced to 103 Ωμm2.
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