Abstract
This paper gives an overview of the use of Atomic Layer deposition (ALD) technique for the emerging and non mainstream ALD applications. These include a special focus on ALD fabrication of multifunctional protective oxide thin films, and textured thin films for electrical, optoelectronic devices, as well textured templates for the cost-effective growth of highly oriented nanowires for light emitting diodes (LED), field-effect transistor (FET) and catalysts with high activity and electivity.
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