Abstract

This contribution presents experimental results from the fabrication of planar photonic structures with two-dimensional (2D) arrangement. We demonstrate the near-field scanning optical microscope (NSOM) lithography as an effective optical method for fabrication of 2D photonic structures in thin photoresist layer. We employ a non-contact mode of NSOM lithography using a metal coated fiber tip in combination with 3D nanoposition piezosystem. Prepared photonic structures in thin photoresist layer deposited on the GaAs substrate are analyzed by scanning probe diagnostics. Set of experiments was realized in order to improve the aspect ratio of the patterned structures, where the exposure time and the intensity of the exposing field were parameters.

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