Structures and Properties of BiFeO<sub>3</sub> Thin Films on Pt(111)/Ti/SiO<sub>2</sub>/Si Substrates Prepared by Pulsed-Laser Deposition under Various Oxygen Partial Pressures

Abstract

Ferroelectric BiFeO3 (BFO) thin films were prepared on Pt (111)/Ti/SiO2/Si substrates by pulsed-laser deposition under various oxygen partial pressures (PO2). The effects of PO2 on the phase, orientation, surface morphology, and ferroelectric properties of the films were investigated, particularly in regard to relationships between structure and properties. It was found that the crystallographic orientation and surface morphology of the BFO thin films strongly depended on PO2. Films prepared at PO2=10 Pa had a high degree of (111) orientation and densely packed grains. A maximum of twice the remanent polarization for the BFO thin film was 68 μC/cm2.