Abstract
Mixed films (6 μm thick) of the binary transition metal alloy system Mo x Ni 100− x (4 < x < 90) were deposited by r.f. sputtering at room temperature onto glass substrates. The composition and homogeneity of the films were tested. The structure of the thin films was determined by X-ray techniques. Depending on the film composition, a crystalline phase, an amorphous phase or a mixed phase of amorphous and crystalline structure is observed.
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