Structure of Nitride and Nitride/Oxide Layers Formed on NiTi Alloy

Abstract

The present work summarises the results, which were obtained from studies carried out on the structure of the nitride and nitride-oxide surface layers with use of the electron transmission microscopy. The layers were formed using glow discharge technique at relatively low temperature (300°C). It has been shown that low temperature nitriding or nitriding/oxiding process produced a thin layer ~30 nm thick. They were formed from titanium nitride as well as titanium oxides. The structure revealed that nanoparticles were surrounded by high amount of amorphous phase. Especially, electron microscopy was useful method for studying the phase boundary between the layer and the NiTi matrix. During deposition process, which was carried out at temperature above 300°C, the intermediate layer of Ni3Ti intermetallic phase appeared between titanium oxides and/or nitrides. Lowering deposition temperature down to 300°C or below resulted in absence of such sublayer. Moreover, thickness, structure of layers, absence of sublayer formed during glow discharge process, can significantly influence deformation during inducing of the shape memory or superelasticity effect.