Abstract
A necessary condition for the preparation of smooth indium tin oxide (ITO) layers prepared by chemical vapour deposition is that the substrate is smooth. For the thinnest films of ITO on zirconia the layer is smooth, but pores were observed along the boundaries of the substrate grains. For layers thicker than 0.25 μm, small and large grains appear, and the sizes of both grow linearly with the layer thickness. On annealing the films in air the number of large grains increases. The difference between the large grains and the background is not chemical. The layers grown are polycrystalline, but there is a preferred direction.
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