Abstract
Chemical vapor deposition of boron is capable of yielding a wide variety of structures. They are studied using the deposition mechanisms proposed in a previous paper (1) and the effect of temperature, interfacial equilibrium, or effective supersaturation of the vapor phase is deduced. The experimental parameters which control the interfacial conditions are inlet gas phase composition, mass flow rate of reactants, and temperature. The full range of variation of boron structure, amorphous, α rhombohedral, β rhombohedral, and β tetragonal is followed by observing the material under these various conditions of growth. β rhombohedral appears as the thermodynamically stable form and α rhombohedral and β tetragonal as metastable crystalline forms occurring at low and high temperatures, respectively.
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