Abstract
Angle-dependent X-ray photoelectron diffraction is used to determine the structure of epitaxial copper films on Ir(111), for coverages below six monolayers in thickness. Diffraction patterns are analyzed using the methods of photoelectron holography to provide a qualitative picture of the near-neighbor structure. Two theoretical models are used for quantitative analysis of interatomic bond-lengths. The complementarity of the two approaches is illustrated by this case study comparison of holography and quantitative photoelectron diffraction.
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