Abstract
The structure of a-C and CN x coatings 1–3 μ thick deposited on metal substrates by arc-pulse sputtering of graphite target in nitrogen background at P = (10−2 −5) Pa was studied by transmission electron microscopy and scanning electron microscopy. Concentration and depth distribution of nitrogen in CN x depend on progressive saturation of graphite target. Nitrogen-free coatings (x = 0) consist of amorphous matrix with multiwalled nanotubes. Structure of carbon nitride coatings depends on nitrogen concentration. Over the range of CN/CC 0.4 CN x coatings are amorphous. The structure of CN0.15<x<0.4 is a mixture of two types of amorphous domains, one of which is decorated by microcrystalline inclusions. The same structured inclusions were found on graphite target modified by electric arc. The obtained results allow understanding the dependence of the CN0≤x≤0.5 coatings properties on nitrogen concentration.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
