Abstract
Electrodeposition of Co–Cr alloys on brass and mild steel substrates has been investigated using direct current (DCD) and pulsed electrodeposition (PED) techniques. The alloy contains approximately 65–81% Co, and 19–35% Cr. The aim of this work is to develop a stable deep eutectic solvent (DES) containing Co(II), and Cr(III) ion without any Cr complexing agent. The influences of direct current and pulsed current on the Co–Cr compositions have been investigated. The crystallographic structures, morphology and chemical composition of Co–Cr deposited films are analyzed by means of XRD, SEM, EDS and XPS. The anticorrosive properties of Co80.04Cr19.95 (DCD) and Co65.44Cr34.55 (PED) alloy on mild steel substrate have been studied and compared using potentiodynamic polarization and electrochemical impedance spectroscopy.
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