Abstract
Pure and fluorine-doped silica glass were fabricated by plasma chemical vapour deposition (PCVD) and characterized using Raman and infrared spectrum. The change in Raman intensity of 945 cm−1 peak, relating to ≡Si—F stretching vibration, agrees with the change of F content. Compared with measured wavenumber in IR spectrum, the calculated absorption wavelength confirms the incorporation form of F into the glass, the detail of which is a tetrahedron with a Si atom in the center coupled with one F atom and three network O atoms. Such structure identification may be useful for explaining some properties of F-doping silica glass.
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Schedule a callMore From: Journal of Wuhan University of Technology-Mater. Sci. Ed.
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