Structure and Surface Property of Carbon Films Deposited on Cemented Carbide by Electron Cyclotron Resonance Plasma Sputtering

Abstract

With excellent properties in mechanics, optics and electricity, carbon film has been received much attention from the increasing scholars. In this study, we focus on the fabrication of carbon film on cemented carbide using electron cyclotron resonance (ECR) plasma sputtering. Electron irradiation and ion irradiation are achieved in ECR plasma sputtering system via the variations of substrate bias and magnetic coils to prepare carbon films, and then the structure, roughness, hardness and friction coefficient of carbon films are investigated. Analysis of Raman spectra indicates that the integrated intensity ratio (ID/IG) increases with the increment of positive substrate bias, but the minimum value of ID/IG occurs while substrate bias is -10 V. X-ray photoelectron spectroscopy (XPS) result shows that ion irradiation process can attain more sp3-C, which is beneficial to promote the hardness of carbon film. Roughness analysis reveals that step coverage effect appears in electron irradiation process, and friction experiments exhibit that carbon films prepared by electron irradiation process hold the lower and more stable friction coefficient. This study sheds light on the deposition of carbon film on cemented carbide by ECR plasma sputtering, which also substantiates that these kinds of carbon films are favorable to enhance the surface property of cemented carbide.