Structure and strain of CdS nanofilms on Au(111) during electrochemical atomic layer deposition growth

Abstract

X-ray scattering is used to characterise the initial stages of the growth of CdS on Au(111) surfaces via electrochemical atomic layer deposition (E-ALD). This work characterises E-ALD films using a unique in-situ setup, allowing for X-ray reflectivity and diffraction data to be obtained to characterise the growth process of the CdS film. Structural information, as well as information concerning growth rates, roughness and strain as a function of the stage in the growth process, are obtained to provide a unique perspective of the early stages of deposition for this methodology. The results show the self-limiting, linear growth rate of CdS films that are wurtzite in structure, are highly epitaxial with the underlying Au substrate, and exhibit little to no chemical impurities during the deposition procedure.