Structure and properties of zirconium oxide films doped with yttrium oxide obtained by laser deposition in vacuum

Abstract

The thin films deposited in vacuum (2 ⋅ 10–2 mm Hg) on the silicon and glass substrates under the multi-pulse high-frequency (10 –15 kHz) laser exposure (laser radiation power density 100 MW/cm2 and the distance from the target to the substrate 40 mm) for zirconium oxide ZrO2 ceramics doped with yttrium oxide 5 % Y2O3. The morphology of the obtained films was studied using atomic force microscopy. The features of transmission spectra in the visible, near infrared and middle infrared region were revealed. The transmission of the zirconium oxide film on the silicon substrate reached 12 % in the spectral region from 1.0 to 2.5 μm, and in the region from 2.6 to 6.0 μm was 4.7 %. On a glass substrate, the transmittance at a wavelength of 643 nm was 60 %, and at a wavelength of 2500 nm it reached 87 %. In the middle infrared region, transmission at a frequency of 2548 cm–1 was 70 % and reached 75 % at a frequency of 3566 cm–1. The volt-ampere and capacitance-voltage characteristics of the obtained zirconium oxide films were characterized by non-linearity, including hysteresis, and are probably due to the presence of discrete surface states with a wide energy spectrum associated with nanoparticles and nanocrystalline film inclusions.