Abstract
Ti0.5Al0.5N coatings with a small amount of Y (up to 1at.%) were deposited by filtered vacuum arc plasma at pulsed high voltage negative substrate bias potential with amplitude up to 2.5kV and their microstructure was studied. X-ray fluorescence analysis showed that this deposition method allows ensuring well the conformity of the elemental composition of the metallic components of cathodes and films. X-ray diffraction measurements of the films with yttrium revealed a solid solution (Ti,Al)N phase with a cubic NaCl-type structure as the only crystalline phase. The films deposited with an amplitude of the substrate bias potential in the range of 1–1.5kV were characterized by a strong axial texture [110]. In these films an increase of the yttrium content leads to the reduction of the nitride lattice parameter and growth of coherent scattering zone dimension as well as to a decrease of the surface roughness. Coatings containing 1at.% Y exhibited high hardness of 32–36GPa and oxidation resistance.
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