Structure and properties of metal nitride films produced by ion implantation

Abstract

Nitride films are grown on Ti, Ta, Mo, W, Ni, Si(111), and NaCl(100) substrates by ion implantation, and their phase composition, structure, and properties are studied. The films produced using a titanium target are multiphase and contain, in addition to TiN and Ti2N (and minor amounts of nitrides of the substrate metal), TiO2 and oxides of the substrate metal in the form of islands 0.04 to 0.2μm in size, distributed at random over the film. The presence of several phases in the films determines their mechanical and electrical properties and ensures good adhesion and corrosion resistance.