Abstract
Metal films particularly of nickel and tungsten, deposited on glass have been studied by electron microscopy in transmission and by replication, and by the measurement of gas adsorption and electrical resistance. From the transmission electron micrographs crystal widths have been obtained and the presence of gaps between the crystals established for nickel films examined as deposited at 273 °K. On sintering, the first stage is the removal of intercrystalline gaps while in later stages surface asperities are removed and crystal growth occurs. The effect of sintering on gas adsorption and electrical resistance has been studied. From the extinction contours on individual nickel crystals in the transmission electron micrographs the detailed crystal shape has been deduced. Films deposited when the substrate was at an elevated temperature showed an area for gas adsorption considerably below that for films which had been sintered at that temperature subsequent to deposition at 273 °K.
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