Abstract
Silicon carbide nanoparticles were synthesized in Si(100) wafers by 300 keV C+ ion implantation at elevated substrate temperatures of 550, 650 and 700 degrees C. The implantation has been carried out upto a fluence of 2 x 10(17) ions/cm2 with a constant current density 1.2 microA/cm2. GIXRD analysis on the implanted sample confirms the formation of 3C-SiC. XTEM studies of sample implanted at 650 degrees C show that size of SiC nanoparticles is 6 nm at a depth 0.6 microm from the sample surface. PL spectrum of sample implanted at different temperatures showed a peak at 2.45 eV and 2.3 eV and the intensity of PL peak increases with implantation temperature. The peak at 2.45 eV corresponds to blue shifted emission from SiC nanoparticles having size 6 nm. The peak at 2.3 eV is assigned to the SiC nanoparticles with enhanced d-value.
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