Structure and mechanical properties of Ti[sbnd]C films deposited using combination of pulsed DC and normal DC magnetron co-sputtering

Abstract

Titanium–carbon (TiC) thin films of different compositions were prepared by a combination of pulsed DC (for Ti target) and normal DC (for graphite target) magnetron co-sputtering on oxidized silicon and fused quartz substrates. At 33.7at.% of C content, pure hcp Ti transforms into fcc-TiC with a preferential orientation of (220) along with (111) and (200). A clear transformation in the preferential orientation from (220) to (111) has been observed when the C content was increased to 56at.%. At 62.5at.% of C, TiC precipitates in an amorphous carbon matrix whereas further increase in C leads to X-ray amorphous films. The cross-sectional scanning electron microscope images reveal that the films with low carbon content consists of columnar grains, whereas, randomly oriented grains are in an amorphous carbon matrix at higher carbon content. A dramatic variation was observed in the mechanical properties such as hardness, H, from 30 to 1GPa and in modulus, E, from 255 to 25GPa with varying carbon content in the films. Resistance to plastic deformation parameter was observed as 0.417 for films containing 62.5at.% of C. Nanoscratch test reveals that the films are highly scratch resistant with a coefficient of friction ranging from 0.15 to 0.04.