Abstract
Ti–Al–N coatings were deposited on Si (1 1 1) and WC substrates by combined cathodic arc middle-frequency magnetron (MF) sputtering under a Ti arc power of 10 kW and with different Al MF targets currents. X-ray diffraction patterns (XRD) showed that the Ti–Al–N coatings were polycrystallize with a preferred (1 1 1) orientation at 2 θ = 43.7°. The (1 1 1) diffraction showed a decrease in peak intensity but a increase in FWHM values with the increasing of Al contents. Nano-meter sized TiN crystal grains distinguished by the lattice fringe contrast were verified by plan-view transmission electron (TEM) and selected area electron diffraction (SAED) images. With the increasing of MF sputter currents from 5 to 20 A, the Al contents in the Ti–Al–N coatings monotonically increased from 4.8 to 10.8 at.%, whereas the N and O contents were nearly constant. The hardness of the Ti–Al–N coatings was in the range of 23–32 GPa, and the Young modulus values were in the range of 420–540 GPa.
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