Structure and mechanical properties of Cr–B–N films deposited by reactive magnetron sputtering

Abstract

Cr–B–N films with various B contents were deposited by reactive magnetron sputtering from the co-deposition of Cr and B targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and Cr–B–N films with various B contents were conducted. The addition of B to CrN films caused a decrease of the crystallization of the films, while the B existed mainly as amorphous phase of BN compound in the CrBN films. The mechanical properties were also improved. And the Cr–B–N films with 6.1 at.% B content showed highest hardness and lowest wear rate.