Abstract
Low-temperature adsorption of $^{4}\mathrm{He}$ films on Alkali metal substrates is investigated theoretically by means of ground-state quantum Monte Carlo simulations. The most accurate potentials currently available are utilized to model the interaction of $^{4}\mathrm{He}$ atoms with the substrate. Continuous growth of film thickness as a function of chemical potential is observed on Li, Na, and K substrates. A superfluid monolayer forms on a Li substrate; on Na and K, thermodynamically stable films are a few layers thick. The uncertainties of the calculation and in the potentials, preclude a definitive conclusion on the existence of a stable $^{4}\mathrm{He}$ film on Rb. A comparison of the results of this calculation with those obtained using the Orsay-Trento density functional shows broad quantitative agreement.
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