Structure and Dielectric Properties of SrTiO3 Films Prepared by Pulsed Laser Deposition Technique

Abstract

Strontium titanate thin films have been prepared on Pt-coated and p-type bare Si(100) substrates by a pulsed laser deposition technique. Both the substrate temperature and the oxygen pressure substantially affected the crystal structure, microstructure and texture characteristics of the SrTiO3 films. The (110)-textured films were obtained at 650° C under oxygen pressure of 1 mbar. The apparent dielectric constants increased with the thickness of the films and was accounted for by the formation of the low-dielectric-constant interacting layer, which was connected with the SrTiO3 films in series. The true dielectric constant of the (110)-textured SrTiO3 films was estimated to be K STO=239 (100 kHz).