Abstract
Methods for the determination of the density of sputtered films of MoS 2 are discussed and the problems connected with the determination of the film thickness are elucidated. The density determined for different coating parameters is given and the results are compared with the data of natural MoS 2. The deviation from the bulk value is explained by morphological properties of the films. In addition, the influence of sputtering conditions on the structure of the films is mentioned and the results are correlated with these data.
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