Abstract
Films of fullerenes and fullerene-containing materials have been synthesized from their solutions of various volumes in aromatic and non-aromatic solvents. The photographs and the sizes of the resulting microstructures have been presented. The comparison of IR spectra has been given. Specific conductivity values have been considered.
Highlights
It is indisputable that the electronic industry of the 21st century is marked by a rapid increase in the use of new materials that differ from the elements of traditional solid-state electronics in their chemical composition, and in the phase component of the functional layers
Microphotographs of the surfaces of fullerene and fullerene-containing material (FCM) films deposited using various solvents are shown in Fig. 1 with the indication of the chemical formula of the solvent and the volume of solution deposited on the substrate
On the basis of the analysis of the absorption coefficient dependence on the wave number within the studied range for fullerene-containing materials, the volume of the deposited solution being equal to 0.15 ml, we can conclude that there are absorption peaks for only higher hydrocarbons - the components of FCM [12]
Summary
It is indisputable that the electronic industry of the 21st century is marked by a rapid increase in the use of new materials that differ from the elements of traditional solid-state electronics in their chemical composition, and in the phase component of the functional layers. One of the unique features of carbon systems is that they allow the formation of 2D and 3D nanoscale objects (graphenes, nanotubes, fullerenes, etc.), which can be used as functional elements of integrated microcircuits and are capable of changing the macro properties of microstructures significantly [1, 3, 4]. Under the influence of various solvents, fullerene forms microstructures of different shapes [5,6,7]. We consider the influence of aromatic solvents and chlorinated methanes on the formation of fullerene C60 films. We tried to determine in what way the amount of starting material and the use of various kinds of solvents affect the resistive properties of the studied carbon films
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