Abstract
SUMMARYThe structure and thermal stability of Ni100-xPxfilms (8<x<14.5) under isothermal annealing have been studied by X-ray and DTA methods. Equilibrium Ni and Ni3P phases have been found to be the final breakdown products on crystallisation of amorphous Ni-P films. The start of the crystallisation process for the concentration range studied has been shown to be shifted towards a higher temperature region with increasing phosphorus concentration. Non-equilibrium conditions of crystallisation using pulsed electrodeposition have been shown to have an essential effect on the processes of structure relaxation.
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