Abstract
The formation of epitaxially stabilized (pseudomorphic) Fe and Co silicides on Si(111) is reviewed. We show that, apart from the α-FeSi 2 phase, which is also stable in bulk form at high temperatures, none of the pseudomorphic phases is ever likely to be the lowest energy phase, with the exception of FeSi with the CsCl structure. For FeSi, the positive contribution of the interface to the total energy of the bulk stable phase, ϵ-FeSi, is sufficiently large to reverse the stability, i.e. (CsCl)FeSi is truly stable for thicknesses below H c ∼ 15 A ̊ . From the structural point of view, Fe and Co silicides are found to be more similar than believed heretofore. In particular, we find that, at low substrate temperatures and under particular conditions, CoSi 2 may crystallize with a CsCl structure with random metal vacancies instead of the well known bulk stable CaF 2 structure.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
