Abstract
In this paper, 3% and 5 % of Ag doped copper oxide (CuO) deposited onto silicon substrates as thin film using the DC magnetron sputtering process under Ar gas. The sputtering deposition was performed by using a power of 75 W. XRD results conformed a good crystallinity of the synthesized Ag/CuO nanoparticle thin films. SEM analysis indicated to all the prepared samples are having a quasi-spherical shape. Based on AFM analysis, the roughness of prepared samples determined and found the high roughness of 3% Ag/CuO sample that attitude to have it a less mean crystal size compated with 5% Ag/CuO, which calculated using Scherrer equation. The EDX spectra indicated the high purities for the prepared sample befor and after deposted on Si as substrate
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