Structural factors determining the nanomechanical performance of transition metal nitride films

Abstract

ABSTRACTChromium nitride (CrN) and Titanium nitride (TiN) thin films were deposited employing unbalanced magnetron sputtering (UBMS) for various values of substrate bias voltage (Vb). The structural characterization of the films in terms of phase identification and the density determination was achieved utilizing X-Ray techniques (XRD and XRR respectively), while the internal stresses were calculated by the change of the substrate's curvature using Stoney's equation. The nanomecahnical properties of the films (hardness and elastic modulus) were investigated using the Nanoindentation (NI) technique in the Continuous Stiffness Measurement (CSM) configuration. According to the NI results the hardness of the films ranges between between 15–25 GPa while the elastic modulus between 180–250 GPa. The analysis revealed that the hardness of the films is maximum when their orientation is pure (either [111] or [100]), while it is minimized under mixed orientation regime. Furthermore, the hardness of the films increases as the internal compressive stresses and the mass density increase. The latter can be validated through the comparison of the results concerning the above films to reported results for TiN films prepared by balanced magnetron sputtering (BMS)