Abstract
Metallization of organic surfaces is important especially for applications in molecular electronics. It can be realized by different means, one promising albeit less studied method being gas-phase deposition of metal clusters. Here, we report on the interactions of gas-phase Cu, Ag, and Au clusters with n-dodecanethiolate self-assembled monolayers (SAMs) on Au substrate. The morphology and composition of the deposited clusters and their impact on the interface structure of the SAM/Au substrate were investigated using scanning tunneling microscopy. The chemical and physical interactions between the clusters and thiolates were characterized using X-ray photoelectron spectroscopy. The Au clusters are found to penetrate through the monolayer as a whole and partially retain their spherical geometry, whereas atom-by-atom diffusion and/or defect-mediated penetration are proposed for the Cu and Ag clusters.
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